Product Description
This light and moisturizing gel cream can help to make sensitive skin blemish calming and relief with centella asiatica leaf water 70% and tee tree leaf water 10% from skin stress. Ingredients Centella Asiatica Leaf Water, Melaleuca Alternifolia (Tea Tree) Leaf Water, Butylene Glycol, Water, Niacinamide, Phenyl Trimethicone, Cyclopentasiloxane, Cyclohexasiloxane, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Arginine, 1,2-Hexanediol, Sodium Hyaluronate, C12-14 Pareth-12, Dimethicone/Vinyl Dimethicone Crosspolymer, Dimethicone Crosspolymer, Caprylyl Glycol, Brassica Oleracea Italica (Broccoli) Extract, Medicago Sativa (Alfalfa) Extract, Brassica Oleracea Capitata (Cabbage) Leaf Extract, Triticum Vulgare (Wheat) Germ Extract, Brassica Campestris (Rapeseed) Extract, Raphanus Sativus (Radish) Seed Extract, Allantoin, Centella Asiatica Extract, Melaleuca Alternifolia (Tea Tree) Leaf Extract, Adenosine, Ethylhexylglycerin, Dipotassium Glycyrrhizate, Citrus Aurantium Bergamia (Bergamot) Fruit Oil, Pentylene Glycol, Aspalathus Linearis Extract, Glycyrrhiza Glabra (Licorice) Root Extract Centella Calming Gel Cream Effect 1. Protect sensitive skin with natural ingredients! - Effective ratio of Centella leaf water 70% and tea trea leaf water 10% helps to improve sensitive skin 2, Strengthen your skin! Skin stress ZERO! - Tritepenoids extract from Centella Asiatica Leaf Water makes your skin clear and healthy! 3. Scratch skin soothing, nutritious, hydrating! - Contains 6,000 ppm of 6 sprouts extracts in patented organic form with abundant moisture and nutrients! 4. Skin Whitening & Wrincle improvement - Confirmation of KFDA substance Functional ingredients, Niacin amide, adenosine content
Features
- Lower skin temperature / Gel type lightly / More moisturizing / Full nutrition
- Instead of purified water, Centella Asiatica leaf water 70% + Tee tree leaf water 10% + patented buds extracts 6,000ppm
- Completed basic skin base before make-up
- Fresh, Oil Free Gel Type / Quick absorption, skin temp. lowering
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Details were last updated on Aug 24, 2026 12:00 +08.